Samsung electronics co., ltd. (20250098264). SEMICONDUCTOR DEVICE
SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
SEMICONDUCTOR DEVICE
This abstract first appeared for US patent application 20250098264 titled 'SEMICONDUCTOR DEVICE
Original Abstract Submitted
a semiconductor device includes an insulating layer including a first surface, a second surface, and an element isolation trench, an insulating pattern on the first surface of the insulating layer, an active pattern on the insulating pattern and including channel patterns, a source/drain pattern on at least one side of the active pattern, a lower wiring structure on the second surface of the insulating layer, and a through-via that extending in the insulating layer and connecting the source/drain pattern and the lower wiring structure, where the insulating pattern may include a first portion between the insulating layer and the active pattern, a second portion surrounding at least a portion of the through-via, and a third portion on a bottom surface of the element isolation trench.
- Samsung electronics co., ltd.
- Sangcheol Na of Suwon-si KR
- Beomjin Kim of Suwon-si KR
- Yoolim Ahn of Suwon-si KR
- Kyoungwoo Lee of Suwon-si KR
- Minseung Lee of Suwon-si KR
- Hyeryeong Lee of Suwon-si KR
- Keun Hwi Cho of Suwon-si KR
- Seungseok Ha of Suwon-si KR
- H01L29/417
- H01L27/088
- H01L29/06
- H01L29/423
- H01L29/775
- H01L29/786
- CPC H10D64/254
