Samsung electronics co., ltd. (20250063804). SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
Organization Name
Inventor(s)
Jeonghyuk Yim of Suwon-si (KR)
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
This abstract first appeared for US patent application 20250063804 titled 'SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
Original Abstract Submitted
provided is a semiconductor device and method of manufacturing same, the method including: preparing a substrate including first and second regions; forming a first and second channel patterns in the first and second regions, wherein the first and second channel patterns each include a plurality of semiconductor patterns vertically stacked on the substrate, an inner region, and an outer region; forming a high-k dielectric layer covering the first channel pattern and the second channel pattern; forming a first protective mask on the high-k dielectric layer in the first region and the second region; removing the first protective mask from the first outer region and the second outer region; and forming an additional mask layer surrounding the first channel pattern and the second channel pattern, wherein the additional mask layer does not have etch selectivity with the first protective mask.
