Samsung electronics co., ltd. (20250014871). SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
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SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
This abstract first appeared for US patent application 20250014871 titled 'SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
Original Abstract Submitted
according to an aspect of the present inventive concepts, a semiconductor processing apparatus includes: a chamber; an electrostatic chuck in an internal space of the chamber; a plurality of grid electrodes installed on the electrostatic chuck so as to be separated from each other in a first direction, perpendicular to an upper surface of the electrostatic chuck, and respectively having a plurality of through-holes; a plurality of reflectors between the plurality of grid electrodes and the electrostatic chuck and reflecting ions passing through the plurality of through-holes in each of the plurality of grid electrodes; and a voltage supply unit outputting a bias voltage having a predetermined cycle to at least one of the plurality of grid electrodes, wherein each of the plurality of grid electrodes includes a base plate containing a conductive material, and a cover layer covering a surface of the base plate and containing a metal oxide.