Samsung electronics co., ltd. (20250001433). SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM
Organization Name
Inventor(s)
Byoung Chaul Son of Anseong-si KR
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM
This abstract first appeared for US patent application 20250001433 titled 'SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING SYSTEM
Original Abstract Submitted
a substrate treating apparatus in which foreign substances are reduced by using a foreign substance collecting unit includes a magnetic structure. the substrate treating apparatus includes a roller configured to be disposed on a rail extending in a first direction and attached to a side surface of a carrier unit to move along the rail, and a foreign substance collecting unit installed on the side surface of the carrier unit, moving together with the roller, and configured to be spaced apart from the rail when the roller is disposed on the rail, wherein the foreign substance collecting unit includes a magnetic structure for adsorbing foreign magnetic substances using a magnetic force, and a case surrounding the magnetic structure.