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Samsung electronics co., ltd. (20240431098). SEMICONDUCTOR DEVICE INCLUDING PERIPHERAL INSULATING STRUCTURE

From WikiPatents

SEMICONDUCTOR DEVICE INCLUDING PERIPHERAL INSULATING STRUCTURE

Organization Name

samsung electronics co., ltd.

Inventor(s)

Dongkyun Lim of Suwon-si (KR)

Kyumin Kim of Suwon-si (KR)

Hyejin Kim of Suwon-si (KR)

Seungyoon Song of Suwon-si (KR)

SEMICONDUCTOR DEVICE INCLUDING PERIPHERAL INSULATING STRUCTURE

This abstract first appeared for US patent application 20240431098 titled 'SEMICONDUCTOR DEVICE INCLUDING PERIPHERAL INSULATING STRUCTURE



Original Abstract Submitted

a semiconductor device includes bitlines on a cell region of a substrate; a contact plug between the bitlines; a landing pad on the contact plug; a peripheral gate on a peripheral circuit region of the substrate; a lower interlayer insulating layer covering a side surface of the peripheral gate; a peripheral contact plug penetrating through the lower interlayer insulating layer; peripheral interconnection layers on the lower interlayer insulating layer and the peripheral contact plug; and peripheral insulating structures passing between the peripheral interconnection layers, wherein the peripheral insulating structures include a first peripheral insulating structure partially penetrating through the lower interlayer insulating layer, and wherein the first peripheral insulating structure includes a first peripheral insulating layer, a second peripheral insulating layer on the first peripheral insulating layer and passing between the peripheral interconnection layers, and a mixture layer between the lower interlayer insulating layer and the first peripheral insulating layer.

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