Samsung electronics co., ltd. (20240377563). ON-CHIP NANOSCALE DIFFRACTIVE OPTICAL ELEMENT simplified abstract
ON-CHIP NANOSCALE DIFFRACTIVE OPTICAL ELEMENT
Organization Name
Inventor(s)
Haeri Park Hanania of Sierra Madre CA (US)
Radwanul Hasan Siddique of Monrovia CA (US)
Mahsa Torfeh of Los Angeles CA (US)
Yibing Michelle Wang of Temple City CA (US)
ON-CHIP NANOSCALE DIFFRACTIVE OPTICAL ELEMENT - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240377563 titled 'ON-CHIP NANOSCALE DIFFRACTIVE OPTICAL ELEMENT
The patent application describes a diffractive optical element (DOE) with a substrate layer and a nanostructure layer containing pillar-shaped nanostructures or holes with a periodicity of 0.75λ to 3λ of a target wavelength.
- The nanostructures have plan-view cross-sectional shapes like circles, ovals, squares, or rectangles, with rounded corners of specific radii to control light dot nonuniformity in diffraction patterns.
- Pillar-shaped nanostructures have a higher refractive index than the substrate layer, while holes have a lower refractive index.
- The DOE aims to improve diffraction pattern quality and control light distribution for various applications.
Potential Applications: - Optical devices - Holographic displays - Beam shaping in laser systems
Problems Solved: - Controlling light dot nonuniformity in diffraction patterns - Enhancing diffraction efficiency and pattern quality
Benefits: - Improved optical performance - Enhanced control over light distribution - Potential for advanced optical applications
Commercial Applications: Title: Advanced Diffractive Optical Elements for Precision Optical Systems This technology can be used in high-end optical systems, laser technologies, and advanced imaging devices, catering to industries like aerospace, defense, and research institutions.
Questions about the Technology: 1. How does the nanostructure layer impact the diffraction pattern quality? 2. What are the specific advantages of using pillar-shaped nanostructures over holes in the substrate layer?
Original Abstract Submitted
a diffractive optical element (doe) includes a substrate layer; and a nanostructure layer comprising nanostructures having a predetermined periodicity ranging from 0.75� to 3� of a target wavelength �. the nanostructures are pillar-shaped nanostructures formed on a surface of the substrate layer, holes formed in the substrate layer, or a combination thereof. at least one nanostructure has a plan-view cross-sectional shape of a circle, an oval, a square, or a rectangle. the plan-view cross-sectional shape of at least one nanostructure includes a rounded corner having a corner radius selected based on a desired light dot nonuniformity of a diffraction pattern generated by the doe. when the nanostructures are pillar-shaped, a refractive index of the nanostructures is greater than a refractive index of the substrate layer. when the nanostructures are holes, a refractive index of the nanostructures is less than a refractive index of the substrate layer.
