Samsung electronics co., ltd. (20240312765). SUBSTRATE PROCESSING APPARATUS simplified abstract
SUBSTRATE PROCESSING APPARATUS
Organization Name
Inventor(s)
Kyung Min Lee of Suwon-si (KR)
Myung Jae Yoo of Suwon-si (KR)
Sung-Yeol Kim of Suwon-si (KR)
Sang Yeol Park of Suwon-si (KR)
Sung Yong Lim of Suwon-si (KR)
SUBSTRATE PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240312765 titled 'SUBSTRATE PROCESSING APPARATUS
The abstract describes a substrate processing apparatus with a controller that includes a signal analyzer, a radio frequency signal generator, a harmonic controller, an operator, and a filter.
- Signal analyzer detects characteristics of a first signal provided to a chamber.
- RF signal generator generates an RF signal based on the power of the first signal.
- Harmonic controller generates a second signal based on the power and characteristics of the first signal.
- Operator performs operations on the RF signal and the second signal.
- Filter generates an RF control signal by filtering the output signal of the operator.
Potential Applications: - Semiconductor manufacturing - Thin film deposition processes - Plasma etching processes
Problems Solved: - Precise control of RF signals in substrate processing - Optimization of process parameters for improved outcomes
Benefits: - Enhanced process control and efficiency - Improved product quality and consistency - Reduction in production costs
Commercial Applications: Title: "Advanced Substrate Processing Apparatus for Semiconductor Manufacturing" This technology can be utilized in semiconductor fabrication facilities to enhance process control and optimize production efficiency. It can also be valuable in industries requiring precise substrate processing techniques.
Prior Art: Readers can explore prior patents related to substrate processing apparatus, RF signal control, and semiconductor manufacturing processes to gain a deeper understanding of the technology landscape.
Frequently Updated Research: Stay updated on advancements in substrate processing technology, RF signal control methods, and semiconductor manufacturing innovations to leverage the latest developments in the field.
Questions about Substrate Processing Apparatus: 1. How does the harmonic controller improve the efficiency of substrate processing?
The harmonic controller optimizes the power and characteristics of the RF signal, leading to more precise control over the processing parameters.
2. What are the key advantages of using a signal analyzer in substrate processing?
The signal analyzer helps in detecting and analyzing important characteristics of the input signal, enabling better process control and optimization.
Original Abstract Submitted
a substrate processing apparatus including the controller are provided. the controller includes: a signal analyzer configured to detect at least one of an amplitude, phase, and frequency of a first signal, which is provided to a chamber; a radio frequency (rf) signal generator configured to generate an rf signal with a natural frequency based on a power of the first signal; a harmonic controller configured to generate a second signal based on the power of the first signal and at least one of the amplitude, phase, and frequency of the first signal, the second signal having a different amplitude, a different phase, and/or a different frequency from the rf signal; an operator configured to perform an operation on the rf signal and the second signal; and a filter configured to generate an rf control signal by filtering an output signal of the operator.