Samsung electronics co., ltd. (20240272561). METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS simplified abstract
METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS
Organization Name
Inventor(s)
Seungbeom Park of Suwon-si (KR)
Jangwoon Sung of Suwon-si (KR)
METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240272561 titled 'METHOD OF MANAGING SEMICONDUCTOR PROCESSING APPARATUS
The patent application describes a method for managing a semiconductor processing apparatus using extreme ultraviolet (EUV) light.
- Irradiating multiple regions on a diffuser on a mask stage with EUV light from a light source.
- Reflecting or transmitting the EUV light through the diffuser.
- Transmitting the EUV light from the diffuser through an optical system.
- Receiving the EUV light with an image sensor to obtain original images.
- Generating predictive images based on an optical prediction model to estimate diffraction patterns.
- Adjusting the optical prediction model by comparing predictive images with original images.
- Generating wavefront images based on the optical prediction model for each mirror's optical characteristics.
Potential Applications: - Semiconductor manufacturing - Optical system design - Image sensor technology
Problems Solved: - Enhancing semiconductor processing accuracy - Improving diffraction pattern estimation - Optimizing optical system performance
Benefits: - Increased precision in semiconductor processing - Enhanced image sensor capabilities - Improved optical system efficiency
Commercial Applications: Title: Advanced Semiconductor Processing Management System This technology can be utilized in semiconductor fabrication facilities to enhance production efficiency and accuracy. It can also be integrated into optical system design companies to improve imaging capabilities.
Questions about the technology: 1. How does this method improve semiconductor processing accuracy? 2. What are the key advantages of using EUV light in this context?
Frequently Updated Research: Ongoing research in the field of EUV lithography and optical system design may provide further insights into improving semiconductor processing techniques.
Original Abstract Submitted
provided is a method of managing a semiconductor processing apparatus, including irradiating, by a light source, a plurality of regions included in a diffuser on a mask stage with extreme ultraviolet (euv) light, reflecting or transmitting, by the diffuser, the euv light, transmitting, by an optical system, the euv light from the diffuser, receiving, by an image sensor, the euv light from the optical system, obtaining, by the image sensor, a plurality of original images corresponding to the plurality of regions, generating, based on an optical prediction model, a plurality of predictive images estimating a diffraction pattern in the image sensor, adjusting an optical prediction model by comparing the plurality of predictive images with the plurality of original images, and generating, based on the optical prediction model, a plurality of wavefront images corresponding to optical characteristics of each of the plurality of mirrors.
