Samsung electronics co., ltd. (20240258239). SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
Organization Name
Inventor(s)
SEOKMYEONG Kang of Suwon-si KR
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
This abstract first appeared for US patent application 20240258239 titled 'SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
Original Abstract Submitted
a semiconductor device includes: a first interlayer insulating layer disposed on a substrate; a first conductive line disposed in the first interlayer insulating layer and having a protrusion protruding above an upper side of the first interlayer insulating layer; an etch stop layer disposed on the first interlayer insulating layer and the first conductive line; and a via passing through the etch stop layer and contacting the first conductive line, wherein the etch stop layer includes a first etch stop layer having a curved shape in a cross-sectional view and a second etch stop layer disposed on the first etch stop layer and having a thickness variation.