FACILITY LAYOUT DETERMINING METHOD AND FACILITY LAYOUT SYSTEM

Organization Name

samsung electronics co., ltd.

Inventor(s)

Gyuduck Bae of Suwon-si KR

Pilsung Koh of Suwon-si KR

Sangsu Kim of Suwon-si KR

Kyuman Yeon of Suwon-si KR

Soyeon Lee of Suwon-si KR

Bora Jeong of Suwon-si KR

Boseok Hong of Suwon-si KR

Jisan Kwak of Suwon-si KR

Haegeun Park of Suwon-si KR

Yonghwan Baek of Suwon-si KR

Chulho Song of Suwon-si KR

Seungyong Lee of Suwon-si KR

FACILITY LAYOUT DETERMINING METHOD AND FACILITY LAYOUT SYSTEM

This abstract first appeared for US patent application 20240256724 titled 'FACILITY LAYOUT DETERMINING METHOD AND FACILITY LAYOUT SYSTEM

Original Abstract Submitted

a method of determining a facility layout of a semiconductor factory including a main floor including processing zones, a clean sub-fab (csf) floor under the main floor, and a facility sub-fab (fsf) floor under the csf floor includes receiving data related to main facilities to be placed on the main floor, csf subsidiary facilities to be placed on the csf floor, and fsf subsidiary facilities to be placed on the fsf floor, and determining the facility layout including a layout of the main facilities for the main floor, a layout of the csf subsidiary facilities for the csf floor, and a layout of the fsf subsidiary facilities for the fsf floor.