VAPOR SUPPLY APPARATUS

Organization Name

samsung electronics co., ltd.

Inventor(s)

Changhwan Kim of Suwon-si (KR)

Takafumi Noguchi of Yokohama-shi (JP)

Toshihiro Iizuka of Yokohama-shi (JP)

Kenichi Nagayama of Yokohama-shi (JP)

VAPOR SUPPLY APPARATUS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240254623 titled 'VAPOR SUPPLY APPARATUS

The abstract describes a vapor supply apparatus that stably supplies vapor to a process chamber when the vapor pressure of the material is lower than the process pressure. The apparatus includes a supply container accommodating a solid or a liquid with a lower vapor pressure than the process pressure. Vapor can be generated in the supply container from a liquid or solid. A buffer tank is placed between the supply container and the process chamber, where the vapor is introduced by reducing pressure. The apparatus also features a mechanism for pressurizing the buffer tank and pressure-feeding the vapor to the process chamber.

The apparatus supplies vapor to a process chamber when the material's vapor pressure is lower than the process pressure.
It includes a supply container for solids or liquids with lower vapor pressure, capable of generating vapor.
A buffer tank is used to introduce vapor into the process chamber by reducing pressure.
A mechanism pressurizes the buffer tank and feeds the vapor to the process chamber.

Potential Applications: - Semiconductor manufacturing - Chemical processing - Pharmaceutical production

Problems Solved: - Ensures stable vapor supply in processes with varying pressure requirements - Facilitates the use of materials with low vapor pressure in high-pressure environments

Benefits: - Improved process efficiency - Enhanced control over vapor supply - Increased flexibility in material selection

Commercial Applications: Title: Advanced Vapor Supply Apparatus for Industrial Processes This technology can be utilized in industries such as semiconductor manufacturing, chemical processing, and pharmaceutical production to ensure precise and stable vapor supply in high-pressure environments, leading to increased efficiency and control over processes.

Questions about Vapor Supply Apparatus: 1. How does the vapor supply apparatus maintain stability in supplying vapor to the process chamber? The apparatus utilizes a buffer tank and a mechanism for pressurizing the tank to ensure a consistent and controlled flow of vapor to the process chamber.

2. What are the key advantages of using a vapor supply apparatus in industrial processes? The key advantages include improved process efficiency, enhanced control over vapor supply, and increased flexibility in material selection for various applications.

Original Abstract Submitted

a vapor supply apparatus is described. the apparatus stably supplies vapor to a process chamber when the vapor pressure of the material is lower than the process pressure. the apparatus includes a supply container accommodating a solid or a liquid having a vapor pressure which is lower than the process pressure. the vapor may be generated in the supply container from a liquid or from a solid. a buffer tank is interposed between the supply container and the process chamber and into which the vapor from the container is introduced by reducing pressure. the apparatus includes a mechanism for pressurizing the buffer tank and pressure-feeding the vapor to the process chamber.