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Samsung electronics co., ltd. (20240215140). SOURCE VESSEL FOR EUV simplified abstract

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SOURCE VESSEL FOR EUV

Organization Name

samsung electronics co., ltd.

Inventor(s)

Daegeun Yoon of Suwon-Si (KR)

Sunghyup Kim of Suwon-si (KR)

Seungpyo Hong of Suwon-si (KR)

Injae Lee of Suwon-si (KR)

SOURCE VESSEL FOR EUV - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240215140 titled 'SOURCE VESSEL FOR EUV

The abstract describes a source vessel for extreme ultraviolet (EUV) that includes a body with an outlet for discharging tin debris, an intermediate focus (IF), and a reflector for laser light.

  • The body has an IF cap with a heater and an IF scanner with a cooling pipe.
  • The IF cap has a flow groove for tin residue to flow, connected to a collection container.
  • The reflector has a through-hole for laser light to pass through.

Potential Applications: - Semiconductor manufacturing - Lithography processes - EUV light sources

Problems Solved: - Efficient removal of tin debris - Maintaining optimal temperature for the IF - Ensuring proper cooling of the IF scanner

Benefits: - Improved EUV source vessel performance - Enhanced reliability and longevity - Higher quality EUV output

Commercial Applications: - EUV lithography equipment manufacturers - Semiconductor fabrication facilities - Research institutions in nanotechnology

Prior Art: Prior art related to this technology may include patents or research papers on EUV source vessels, tin debris removal systems, and laser reflectors in lithography equipment.

Frequently Updated Research: Stay updated on advancements in EUV technology, semiconductor manufacturing processes, and nanofabrication techniques for potential improvements in EUV source vessels.

Questions about EUV Source Vessels: 1. How does the design of this source vessel improve EUV lithography processes? 2. What are the key challenges in developing efficient EUV source vessels for semiconductor manufacturing?


Original Abstract Submitted

a source vessel for extreme ultraviolet (euv) includes a body that includes an outlet for discharging tin debris disposed in a central portion and an intermediate focus (if) disposed in an upper end portion, and a reflector disposed in a lower end of the body and that includes a through-hole through which laser light passes. the body includes an if cap portion disposed on a lower portion of the intermediate focus and that includes a heater disposed on an outer surface thereof, and an if scanner portion disposed on an upper portion of the intermediate focus and that includes a cooling pipe disposed on an external surface thereof. an inner surface of the if cap portion includes a flow groove through which tin residue flows, and the source vessel further includes a collection container connected to the flow groove.