DEPOSITION MASK AND METHOD FOR MANUFACTURING THE SAME

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DEPOSITION MASK AND METHOD FOR MANUFACTURING THE SAME

This abstract first appeared for US patent application 20250144664 titled 'DEPOSITION MASK AND METHOD FOR MANUFACTURING THE SAME

Original Abstract Submitted

a deposition mask includes a silicon substrate including cell areas and a mask frame area excluding the cell areas, the mask frame area including a mask rip area partitioning the cell areas and an outer frame area disposed at an outermost portion of the silicon substrate, a mask rip disposed in the mask rip area, a mask membrane disposed in each of the cell areas, a first metal frame disposed in the outer frame area, and a second metal frame surrounding an outer portion of the silicon substrate and connected to the first metal frame.