DEPOSITION MASK AND METHOD OF FABRICATING THE SAME

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DEPOSITION MASK AND METHOD OF FABRICATING THE SAME

This abstract first appeared for US patent application 20250101626 titled 'DEPOSITION MASK AND METHOD OF FABRICATING THE SAME

Original Abstract Submitted

a method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.