Samsung display co., ltd. (20240174559). PROCESSING APPARATUS AND PROCESSING METHOD simplified abstract
PROCESSING APPARATUS AND PROCESSING METHOD
Organization Name
Inventor(s)
JEONGJIN Park of Yongin-si (KR)
YONG-HOON Kwon of Yongin-si (KR)
BYUNGHOON Kim of Yongin-si (KR)
PROCESSING APPARATUS AND PROCESSING METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240174559 titled 'PROCESSING APPARATUS AND PROCESSING METHOD
Simplified Explanation
The processing apparatus described in the abstract is designed to facilitate ion-exchange between a processing target and materials of a mixture by spraying the mixture into a region of the target, irradiating a beam into the same region, and maintaining a predetermined temperature or higher. This process allows for efficient and controlled ion-exchange to occur.
- The first processing unit sprays a mixture into a specific region of the processing target.
- The second processing unit irradiates a beam into the same region of the processing target.
- The apparatus maintains the temperature of the region at a predetermined level or higher to facilitate ion-exchange between the processing target and materials of the mixture.
Potential Applications
This technology could be applied in industries such as semiconductor manufacturing, chemical processing, and materials science for precise ion-exchange processes.
Problems Solved
This technology solves the problem of inefficient or uncontrolled ion-exchange processes by providing a method to precisely control the temperature and conditions during the exchange.
Benefits
The benefits of this technology include improved efficiency, accuracy, and control in ion-exchange processes, leading to higher quality and more consistent results.
Potential Commercial Applications
One potential commercial application of this technology could be in the production of high-performance electronic devices that require precise ion-exchange processes for optimal performance.
Possible Prior Art
One possible prior art for this technology could be similar processing apparatus used in industries such as semiconductor manufacturing or materials science for ion-exchange processes.
Unanswered Questions
How does this technology compare to existing ion-exchange methods?
This article does not provide a direct comparison between this technology and existing ion-exchange methods.
What are the specific materials that can be used in the mixture for ion-exchange in this apparatus?
The article does not specify the exact materials that can be used in the mixture for ion-exchange in this apparatus.
Original Abstract Submitted
a processing apparatus includes a first processing unit to spray a mixture into a first region of a processing target, and a second processing unit to irradiate a beam into the first region of the processing target, and maintain a temperature of the first region to a predetermined temperature or more, in which the predetermined temperature is for ion-exchange between the processing target and some materials of the mixture.