Rohm co., ltd. (20240421195). NITRIDE SEMICONDUCTOR DEVICE
NITRIDE SEMICONDUCTOR DEVICE
Organization Name
Inventor(s)
Shinya Takado of Kyoto-shi (JP)
NITRIDE SEMICONDUCTOR DEVICE
This abstract first appeared for US patent application 20240421195 titled 'NITRIDE SEMICONDUCTOR DEVICE
Original Abstract Submitted
a nitride semiconductor device includes a passivation layer, which covers a gate layer, and a field plate electrode, which is arranged on the passivation layer. the gate layer includes a gate layer main body and a drain-side extension. the passivation layer includes a first part overlapping both the drain-side extension and the field plate electrode in plan view, a second part continuous with the first part and located between the drain-side extension and the drain opening, and a first step located in a region including a boundary of the first part and the second part. the first part has a first thickness from the upper step surface to an upper surface of the drain-side extension. the second part has a second thickness from the lower step surface to an upper surface of the electron supply layer. the first thickness is greater than the second thickness.