Qualcomm incorporated (20240412450). CHECKERBOARD MASK OPTIMIZATION IN OCCLUSION CULLING

CHECKERBOARD MASK OPTIMIZATION IN OCCLUSION CULLING

Organization Name

qualcomm incorporated

Inventor(s)

Yunzhen Li of Shenzhen (CN)

Duo Wang of Shanghai (CN)

Yanshan Wen of Shanghai (CN)

CHECKERBOARD MASK OPTIMIZATION IN OCCLUSION CULLING

This abstract first appeared for US patent application 20240412450 titled 'CHECKERBOARD MASK OPTIMIZATION IN OCCLUSION CULLING

Original Abstract Submitted

aspects presented herein relate to methods and devices for graphics processing including an apparatus, e.g., a gpu or cpu. the apparatus may obtain pixel information for a plurality of pixels in at least one frame included in a plurality of frames in a scene. the apparatus may also calculate a depth value for each of a first set of pixels. further, the apparatus may identify whether each of the first set of pixels or a second set of pixels, or both, is occluded by at least one occluding object in the scene. the apparatus may configure a pattern mask configuration associated with a visibility mask for the plurality of pixels. the apparatus may also output, based on the pattern mask configuration, an indication of the depth value for the first set of pixels and coverage information for the first set of pixels or the second set of pixels.