Patent Application 17498997 - Pattern Projecting Apparatus for Use in a - Rejection

Patent Application 17498997 - Pattern Projecting Apparatus for Use in a

Title: Pattern Projecting Apparatus for Use in a Three-Dimensional Imaging Arrangement

Application Information

• Invention Title: Pattern Projecting Apparatus for Use in a Three-Dimensional Imaging Arrangement
• Application Number: 17498997
• Submission Date: 2025-05-23T00:00:00.000Z
• Effective Filing Date: 2021-10-12T00:00:00.000Z
• Filing Date: 2021-10-12T00:00:00.000Z
• National Class: 359
• National Sub-Class: 642000
• Examiner Employee Number: 78146
• Art Unit: 2882
• Tech Center: 2800

Rejection Summary

• 102 Rejections: 1
• 103 Rejections: 0

Cited Patents

The following patents were cited in the rejection:

• US 0389654🔗

Office Action Text

    DETAILED ACTION

Notice of Pre-AIA  or AIA  Status
The present application, filed on or after March 16, 2013, is being examined under the first inventor to file provisions of the AIA .

Claim Rejections - 35 USC § 102
In the event the determination of the status of the application as subject to AIA  35 U.S.C. 102 and 103 (or as subject to pre-AIA  35 U.S.C. 102 and 103) is incorrect, any correction of the statutory basis (i.e., changing from AIA  to pre-AIA ) for the rejection will not be considered a new ground of rejection if the prior art relied upon, and the rationale supporting the rejection, would be the same under either status.  
The following is a quotation of the appropriate paragraphs of 35 U.S.C. 102 that form the basis for the rejections under this section made in this Office action:
A person shall be entitled to a patent unless –

(a)(2) the claimed invention was described in a patent issued under section 151, or in an application for patent published or deemed published under section 122(b), in which the patent or application, as the case may be, names another inventor and was effectively filed before the effective filing date of the claimed invention.

Claims 1-8 are rejected under 35 U.S.C. 102(a)(2) as being anticipated by Lee et al.
Lee et al. (US Pub. No. 2021/0389654 A1) discloses (see annotated Figure 3):

    PNG
    media_image1.png
    736
    631
    media_image1.png
    Greyscale

Regarding claim 1, a pattern projecting apparatus (Figure 3, element 10) comprising at least one light source (Figure 3, element 12), at least one projection lens (Figure 3, element 16), at least one mask (Figure 3, element 14) and configured to enable the at least one projection lens (Figure 3, element 16) to illuminate a target (Figure 3, element A) while projecting a pattern thereat (Figure 3, element B), and at least one holder (i.e. housing; element 200), and wherein said pattern projecting apparatus (Figure 3, element 10) is characterized in that the at least one light source (Figure 3, element 12) is a wide area light source (Figure 3, element C), and wherein at least one mask active area (i.e. light-transmitting region [Figure 4, element 142] is formed with a structured pattern; page 5, paragraph 0060, lines 1-5) is smaller than the area of the at least one light source (Figure 3, element 12), thereby enabling to refrain from applying condenser optics or focusing optics (Figure 3, element 18) between the at least one light source (Figure 3, element 12) and the at least one mask (Figure 3, element 14).
Regarding clam 2, a chief ray angle of the projection lens (Figure 3, element 16) is matched with an edge of the active area of the at least one mask (Figure 3, element 14).
Regarding claim 3, a light source (Figure 3, element 12) is a large area LED (page 5, paragraph 0063, lines 1-5) having a diffuse angular distribution (page 4, paragraph 0057, lines 1-4).
Regarding claim 4, a small gap (see space between elements 12 and 14 in Figure 3) extends between the at least one light source (Figure 3, element 12) and the least one mask (Figure 3, element 14).
Regarding claim 5, at least one light source (Figure 3, element 12) is in direct contact (i.e. the actuator [element 11] is connected and/or in junction with the light source [element 12] and the mask [element 14]; page 6, paragraph 0078, lines 3-11) with the at least one mask (Figure 3, element 14).
Regarding clam 6, at least one mask (Figure 3, element 14) is a spatial light modulator or a similar active transparent array (page 5, paragraph 0060, lines 1-5), configured to project a varying pattern (i.e. structured pattern).
Regarding claim 7, at least one mask (Figure 3, element 14) is tilted (i.e. offset) relatively to the at least one projection lens (Figure 3, element 16) thereby enabling provisioning of an improved focus (i.e. depth of focus) of a tilted projector across the target area (Figure 3, element A) per requirements of Scheimpflug principle (i.e. the center [element X] of the light source [element 12] and the center [element Y] of the mask [element 14] are not on the optical axis [element A1] of the projection lens [element 16], and the optical axis [element A2] of the projection module [element 10] and the optical axis [element A3] of the receiving module [element 20] form an angle with a certain angle degree; see page 4, paragraph 0047, lines 4-8).
Regarding claim 8, at least one mask (Figure 3, element 14) is latterly offset from the optic axis (Figure 3, element A1) of the at least one projection lens (Figure 3, element 16), and wherein said pattern projection apparatus (Figure 3, element 10) is further tilted to improve uniformity of the illumination obtained while applying a tilted pattern projection apparatus (Figure 3, element 10), relatively to illumination obtained while applying a non-tilted pattern projection apparatus (page 4, paragraph 0047, lines 4-19).

Response to Arguments
Applicant’s arguments filed on 03/10/2025 have been considered but are moot in view of new grounds of rejection.  Applicant's amendment necessitated the new grounds of rejection presented in this Office action.
Regarding claim 1, the applicant has argued that the prior art does not teach “the area of the at least one mask or the at least one mask active area, is smaller than the area of the at least one light source”. However, Lee et al. (US Pub. No. 2021/0389654 A1) teaches at least one mask active area (i.e. light-transmitting region [Figure 4, element 142] is formed with a structured pattern; page 5, paragraph 0060, lines 1-5), is smaller than the area of the at least one light source (Figure 3, element 12).
The Applicant has argued that “amended claim 5, is characterized in that the at least one light source is in direct contact with the at least one mask. However, in the Office Action, the Examiner maintained that the contact between the at least one light source and the at least one mask is achieved by the use of an actuator”. However, Lee et al. (US Pub. No. 2021/0389654 A1) teaches at least one light source (Figure 3, element 12) is in direct contact (i.e. the actuator [element 11] is connected and/or in junction with the light source [element 12] and the mask [element 14]; page 6, paragraph 0078, lines 3-11) with the at least one mask (Figure 3, element 14).

Conclusion
THIS ACTION IS MADE FINAL. Applicant is reminded of the extension of time policy as set forth in 37 CFR 1.136(a).
A shortened statutory period for reply to this final action is set to expire THREE MONTHS from the mailing date of this action. In the event a first reply is filed within TWO MONTHS of the mailing date of this final action and the advisory action is not mailed until after the end of the THREE-MONTH shortened statutory period, then the shortened statutory period will expire on the date the advisory action is mailed, and any nonprovisional extension fee (37 CFR 1.17(a)) pursuant to 37 CFR 1.136(a) will be calculated from the mailing date of the advisory action. In no event, however, will the statutory period for reply expire later than SIX MONTHS from the mailing date of this final action.
Any inquiry concerning this communication or earlier communications from the examiner should be directed to MAGDA CRUZ whose telephone number is (571)272-2114. The examiner can normally be reached Monday-Friday from 9:00 AM to 5:30 PM.
Examiner interviews are available via telephone, in-person, and video conferencing using a USPTO supplied web-based collaboration tool. To schedule an interview, applicant is encouraged to use the USPTO Automated Interview Request (AIR) at http://www.uspto.gov/interviewpractice.
If attempts to reach the examiner by telephone are unsuccessful, the examiner’s supervisor, Toan Ton can be reached at 571-272-2303. The fax phone number for the organization where this application or proceeding is assigned is 571-273-8300.
Information regarding the status of published or unpublished applications may be obtained from Patent Center. Unpublished application information in Patent Center is available to registered users. To file and manage patent submissions in Patent Center, visit: https://patentcenter.uspto.gov. Visit https://www.uspto.gov/patents/apply/patent-center for more information about Patent Center and https://www.uspto.gov/patents/docx for information about filing in DOCX format. For additional questions, contact the Electronic Business Center (EBC) at 866-217-9197 (toll-free). If you would like assistance from a USPTO Customer Service Representative, call 800-786-9199 (IN USA OR CANADA) or 571-272-1000.


/MAGDA CRUZ/
Primary Examiner
Art Unit 2882



05/21/2025