NISSAN CHEMICAL CORPORATION patent applications published on September 12th, 2024

Summary of the patent applications from NISSAN CHEMICAL CORPORATION on September 12th, 2024

1. **Summary**: Nissan Chemical Corporation has recently filed patents for innovative compositions designed for various applications. These patents include advanced electrode compositions for high-performance batteries, resist underlayer film-forming compositions for semiconductor devices, a composition for forming a resist underlayer film in semiconductor device production, and a silicon-containing underlayer film formation composition. Additionally, they have patented an adhesive composition for debonding using infrared radiation. These inventions aim to improve efficiency, precision, and control in various industrial processes.

2. **Key Points of Patents**: - The electrode composition includes an organic compound, a fluorine-based binder, conductive carbon material, and an active material. - The resist underlayer film-forming composition involves compounds that react to form the film. - The composition for forming a resist underlayer film includes a polymer and a solvent. - The silicon-containing underlayer film composition excludes strongly acidic additives. - The adhesive composition for debonding cures through hydrosilylation and includes various polyorganosiloxane species.

3. **Notable Applications**: - The electrode composition can be used in high-performance batteries and energy storage systems. - The resist underlayer film-forming composition is beneficial for semiconductor manufacturing. - The silicon-containing underlayer film composition has applications in semiconductor manufacturing, nanotechnology, and optoelectronics. - The adhesive composition for debonding is useful in industrial bonding processes, electronics manufacturing, and medical device assembly.

Patent applications for NISSAN CHEMICAL CORPORATION on September 12th, 2024

CHEMICAL-RESISTANT PROTECTIVE FILM FORMING COMPOSITION CONTAINING HYDROXYARYL-TERMINATED POLYMER (18616255)

Main Inventor

Shigetaka OTAGIRI

ADHESIVE COMPOSITION FOR INFRARED PEELING, LAMINATE, METHOD FOR PRODUCING LAMINATE, AND PEELING METHOD (18659315)

Main Inventor

Kazuhiro SAWADA

COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION (18285141)

Main Inventor

Shuhei SHIGAKI

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYMER HAVING ALICYCLIC HYDROCARBON GROUP (18271390)

Main Inventor

Shou SHIMIZU

NAPHTHALENE UNIT-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION (18281993)

Main Inventor

Hiroto OGATA

COMPOSITION FOR FORMING ELECTRODE (18574217)

Main Inventor

Tatsuya HATANAKA