ACNE-TREATMENT SYSTEM WITH PROCESSING UNIT

Organization Name

koninklijke philips n.v.

Inventor(s)

BABU Varghese of EINDHOVEN (NL)

YANNYK PARULIAN JULIAN Bourquin of EINDHOVEN (NL)

JONATHAN ALAMBRA Palero of WAALRE (NL)

WILLEM Verkruijsse of VELDHOVEN (NL)

ELVIRA JOHANNA MARIA Paulussen of REPPEL-BOCHOLT (NL)

KIRAN KUMAR Thumma of EINDHOVEN (NL)

ACNE-TREATMENT SYSTEM WITH PROCESSING UNIT

This abstract first appeared for US patent application 20250010093 titled 'ACNE-TREATMENT SYSTEM WITH PROCESSING UNIT

Original Abstract Submitted

according to an aspect, there is provided an acne-treatment system comprising a processing unit () and an acne-treatment apparatus () configured to treat an acne lesion on skin of a subject by means of first treatment light having wavelengths predominantly in a range from 600 to 700 nm and second treatment light having wavelengths predominantly in a range from 400 to 480 nm, the processing unit () being configured to: receive one or more measurement signals provided by one or more sensors () that are configured and arranged to measure one or more parameters indicative of a degree of inflammation and/or a severity phase of the acne lesion, said one or more measurement signals representing an indicated degree of inflammation and/or an indicated severity phase of the acne lesion; determine a light-intensity ratio of intensity of the first treatment light to intensity of the second treatment light to be applied to the acne lesion based on the indicated degree of inflammation and/or the indicated severity phase of the acne lesion represented by the one or more measurement signals; and control one or more light sources () of the acne-treatment apparatus () to generate the first treatment light and the second treatment light according to the determined light-intensity ratio for application to the acne lesion.