Intel corporation (20240253157). METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE
METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE
Organization Name
Inventor(s)
Richard Laming of Santa Clara CA US
Nicholas D. Psaila of Lanark GB
METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE
This abstract first appeared for US patent application 20240253157 titled 'METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE
Original Abstract Submitted
the present application relates to a method for modifying a substrate, which comprises generating a pulsed laser beam comprising a train of laser pulses, the train of laser pulses including at least three consecutive laser pulses, and controlling a direction of the pulsed laser beam and/or a position of the substrate from laser pulse to laser pulse so that the at least three consecutive laser pulses sequentially irradiate at least three regions of the substrate according to a predetermined spatial sequence which defines the relative spatial positions of the at least three regions of the substrate and the order of irradiation of the at least three regions of the substrate. the present application relates also to an apparatus () for modifying a substrate (). the method and apparatus () may be used, in particular though not exclusively, for forming an optical device.