Fujifilm corporation (20250149235). STRUCTURE AND METHOD FOR MANUFACTURING STRUCTURE
STRUCTURE AND METHOD FOR MANUFACTURING STRUCTURE
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STRUCTURE AND METHOD FOR MANUFACTURING STRUCTURE
This abstract first appeared for US patent application 20250149235 titled 'STRUCTURE AND METHOD FOR MANUFACTURING STRUCTURE
Original Abstract Submitted
provided are a structure having a high q value and a small size, and a method for manufacturing a structure. the structure has a planar inductor disposed on a substrate, and further has a first magnetic body portion disposed on a substrate side with respect to the planar inductor with a first insulating layer interposed therebetween, a second magnetic body portion disposed on a side opposite to the substrate side with respect to the planar inductor with a second insulating layer interposed therebetween, and a third magnetic body portion disposed on a center portion of the planar inductor. at least a part of the first magnetic body portion, the second magnetic body portion, and the third magnetic body portion overlap with each other in a normal direction of the substrate, and the first magnetic body portion consists of a first center portion and a plurality of extending portions extending outward from the first center portion in an in-plane direction, or consists of a flat plate portion that covers at least a part of a region from a center of the planar inductor to the outside. the second magnetic body portion consists of a second center portion and a plurality of extending portions extending outward from the second center portion in an in-plane direction, or consists of a flat plate portion that covers at least a part of a region from the center of the planar inductor to the outside.