EOS GMBH ELECTRO OPTICAL SYSTEMS (20250100227). EXPOSURE STRATEGY AT SCAN FIELD BOUNDARIES

EXPOSURE STRATEGY AT SCAN FIELD BOUNDARIES

Organization Name

EOS GMBH ELECTRO OPTICAL SYSTEMS

Inventor(s)

[[:Category:Stefan Gr�nberger of Schondorf DE|Stefan Gr�nberger of Schondorf DE]][[Category:Stefan Gr�nberger of Schondorf DE]]

Stephan Tenbrink of MüNCHEN DE

EXPOSURE STRATEGY AT SCAN FIELD BOUNDARIES

This abstract first appeared for US patent application 20250100227 titled 'EXPOSURE STRATEGY AT SCAN FIELD BOUNDARIES

Original Abstract Submitted

disclosed is a method for generating a control data set for an energy input device of an additive manufacturing device. the method includes accessing computer-based model data of an object cross-section of the object to be manufactured, and generating a data model of a region of a building material layer to be solidified, where the region to be solidified is divided into a plurality of subregions. at least a first subregion and a second subregion adjoin each other at a boundary, and locations in the first subregion are scanned at a time coordinated with locations in the second subregion further, the control data set for the energy input device is generated taking into account the data model generated previously.