Category:Willem Marie Julia Marcel COENE

Willem Marie Julia Marcel COENE

Executive Summary

Willem Marie Julia Marcel COENE is an inventor who has filed 2 patents. Their primary areas of innovation include Fine scanning or positioning (1 patents), AC mode (1 patents), Particular materials (1 patents), and they have worked with companies such as ASML Netherlands B.V. (2 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

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Technology Areas

List of Technology Areas

• G01Q10/04 (Fine scanning or positioning): 1 patents
• G01Q60/32 (AC mode): 1 patents
• G01Q70/14 (Particular materials): 1 patents
• G03F7/70655 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/706851 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G06T7/0004 ({Industrial image inspection}): 1 patents
• G01N21/8851 (Investigating the presence of flaws or contamination): 1 patents
• G01N21/956 (Inspecting patterns on the surface of objects {(contactless testing of electronic circuits): 1 patents
• G03F7/70491 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70641 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G01N2021/8883 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms): 1 patents
• G06T2207/20081 (Special algorithmic details): 1 patents
• G06T2207/20084 (Special algorithmic details): 1 patents
• G06T2207/30148 (Subject of image; Context of image processing): 1 patents

Companies

List of Companies

• ASML Netherlands B.V.: 2 patents

Collaborators

• Mustafa Ümit ARABUL (1 collaborations)
• Zili ZHOU (1 collaborations)
• Nitesh PANDEY of Silicon Valley CA (US) (1 collaborations)
• Coen Adrianus VERSCHUREN (1 collaborations)
• Gerard Jan VERBIEST (1 collaborations)
• Peter Gerard STEENEKEN (1 collaborations)
• Martin Pierre ROBIN (1 collaborations)
• Vasco Tomas TENNER (1 collaborations)