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Category:Takashi Shimazu of Tokyo JP

From WikiPatents

Takashi Shimazu

Takashi Shimazu from Tokyo JP has applied for patents in technology areas such as C23C14/34, B28B11/24, C04B35/453 with semiconductor energy laboratory co., ltd..

Patents

SPUTTERING TARGET, METHOD FOR MANUFACTURING SPUTTERING TARGET, AND METHOD FOR FORMING THIN FILM (20250146126)

Pages in category "Takashi Shimazu of Tokyo JP"

The following 2 pages are in this category, out of 2 total.

1

19018112. SPUTTERING TARGET, METHOD FOR MANUFACTURING SPUTTERING TARGET, AND METHOD FOR FORMING THIN FILM (SEMICONDUCTOR ENERGY LABORATORY CO., LTD.)

S

Semiconductor energy laboratory co., ltd. (20250146126). SPUTTERING TARGET, METHOD FOR MANUFACTURING SPUTTERING TARGET, AND METHOD FOR FORMING THIN FILM

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