Category:Sihui HE of Santa Clara CA (US)

Sihui HE of Santa Clara CA (US)

Executive Summary

Sihui HE of Santa Clara CA (US) is an inventor who has filed 6 patents. Their primary areas of innovation include {Mixed reality (object pose determination, tracking or camera calibration for mixed reality (3 patents), of the optical waveguide type ( (3 patents), PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices (2 patents), and they have worked with companies such as Applied Materials, Inc. (6 patents). Their most frequent collaborators include (5 collaborations), (2 collaborations), (2 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• G06T19/006 ({Mixed reality (object pose determination, tracking or camera calibration for mixed reality): 3 patents
• G02B6/10 (of the optical waveguide type (): 3 patents
• G03F7/706849 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G03F7/706851 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 2 patents
• G02B5/04 (Prisms): 2 patents
• G03F7/706837 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/70725 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G02B27/0101 (Head-up displays): 1 patents
• G02B2027/0112 (OPTICAL ELEMENTS, SYSTEMS OR APPARATUS): 1 patents
• G02B27/0172 (Head-up displays): 1 patents
• G03F7/706845 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents

Companies

List of Companies

• Applied Materials, Inc.: 6 patents

Collaborators

• Jinxin FU of Fremont CA (US) (5 collaborations)
• Yangyang SUN of San Jose CA (US) (2 collaborations)
• David Alexander SELL of Santa Clara CA (US) (2 collaborations)
• Kevin MESSER of Mountain View CA (US) (2 collaborations)
• Kunal SHASTRI of Santa Clara CA (US) (2 collaborations)
• Samarth BHARGAVA of Saratoga CA (US) (2 collaborations)
• Evan WANG of Palo Alto CA (US) (1 collaborations)
• Ludovic GODET of Sunnyvale CA (US) (1 collaborations)