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Category:Mitsuo Mashiyama of Oyama JP

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Mitsuo Mashiyama

Mitsuo Mashiyama from Oyama JP has applied for patents in technology areas such as C23C14/34, B28B11/24, C04B35/453 with semiconductor energy laboratory co., ltd..

Patents

SPUTTERING TARGET, METHOD FOR MANUFACTURING SPUTTERING TARGET, AND METHOD FOR FORMING THIN FILM (20250146126)

Pages in category "Mitsuo Mashiyama of Oyama JP"

The following 4 pages are in this category, out of 4 total.

1

19017973. DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE (SEMICONDUCTOR ENERGY LABORATORY CO., LTD.)
19018112. SPUTTERING TARGET, METHOD FOR MANUFACTURING SPUTTERING TARGET, AND METHOD FOR FORMING THIN FILM (SEMICONDUCTOR ENERGY LABORATORY CO., LTD.)

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