Category:Jengyi Yu of San Ramon CA (US)

Jengyi Yu of San Ramon CA (US)

Executive Summary

Jengyi Yu of San Ramon CA (US) is an inventor who has filed 6 patents. Their primary areas of innovation include {deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD} (2 patents), {the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers (2 patents), {from the gas phase, by plasma deposition ( (2 patents), and they have worked with companies such as Lam Research Corporation (6 patents). Their most frequent collaborators include (4 collaborations), (4 collaborations), (3 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• H01L21/0228 ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD}): 2 patents
• H01L21/02274 ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers): 2 patents
• G03F7/167 ({from the gas phase, by plasma deposition (): 2 patents
• G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies): 2 patents
• H01L21/0274 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 2 patents
• H01L21/02164 ({the material being a silicon oxide, e.g. SiO): 1 patents
• H01L21/02211 ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers): 1 patents
• G03F7/094 (characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general): 1 patents
• C23C16/047 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• G03F1/22 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• G03F7/091 ({characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement}): 1 patents
• G03F7/70033 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices): 1 patents
• H01L21/0332 (comprising inorganic layers): 1 patents
• G03F7/40 (Treatment after imagewise removal, e.g. baking): 1 patents
• G03F7/0002 ({Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}): 1 patents
• G03F7/36 (Imagewise removal not covered by groups): 1 patents
• G03F7/0042 ({with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists (): 1 patents
• H01J37/32862 (Gas-filled discharge tubes (heating by discharge): 1 patents
• C23C16/4405 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion): 1 patents
• H01L21/30655 (Plasma etching; Reactive-ion etching): 1 patents
• H01L21/0337 ({characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment}): 1 patents
• H01L21/67069 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se): 1 patents

Companies

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List of Companies

• Lam Research Corporation: 6 patents

Collaborators

• Samantha S.H. Tan of Newark CA (US) (4 collaborations)
• Da Li of Newark CA (US) (4 collaborations)
• Alan J. Jensen of Mountain House CA (US) (3 collaborations)
• Chen-Wei Liang of El Cerrito CA (US) (2 collaborations)
• Younghee Lee of Pleasanton CA (US) (2 collaborations)
• Seongjun Heo of Dublin CA (US) (2 collaborations)
• Liu Yang of Seattle WA (US) (1 collaborations)
• Boris Volosskiy of San Jose CA (US) (1 collaborations)
• Richard Wise of Los Gatos CA (US) (1 collaborations)
• Yang Pan of Los Altos CA (US) (1 collaborations)
• Ge Yuan of San Jose CA (US) (1 collaborations)
• Andrew Liang of San Jose CA (US) (1 collaborations)
• Jun Xue of Fremont CA (US) (1 collaborations)
• Mary Anne Manumpil of Fremont CA (US) (1 collaborations)
• Daniel PETER of Sunnyvale CA (US) (1 collaborations)
• Samantha SiamHwa TAN of Newark CA (US) (1 collaborations)
• Meng Xue of San Jose CA (US) (1 collaborations)
• Wook Choi of San Jose CA (US) (1 collaborations)
• Ji Yeon Kim of Fremont CA (US) (1 collaborations)
• Shahd Hassan Labib of San Jose CA (US) (1 collaborations)
• Hongxiang Zhao of San Jose CA (US) (1 collaborations)
• Sivananda Krishnan Kanakasabapathy of Pleasanton CA (US) (1 collaborations)
• Samantha SiamHwa Tan of Newark CA (US) (1 collaborations)
• Ge Yuan of Fremont CA (US) (1 collaborations)
• Siva Krishnan Kanakasabapathy of Pleasanton CA (US) (1 collaborations)