Category:HUI-ZHONG ZHUANG

HUI-ZHONG ZHUANG

Executive Summary

HUI-ZHONG ZHUANG is an inventor who has filed 4 patents. Their primary areas of innovation include Making masks on semiconductor bodies for further photolithographic processing not provided for in group (1 patents), {Forming conducting materials on a substrate} (1 patents), Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers (1 patents), and they have worked with companies such as TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (4 patents). Their most frequent collaborators include (2 collaborations), (2 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• H01L21/027 (Making masks on semiconductor bodies for further photolithographic processing not provided for in group): 1 patents
• H01L21/02697 ({Forming conducting materials on a substrate}): 1 patents
• H01L21/30604 (Chemical or electrical treatment, e.g. electrolytic etching (to form insulating layers): 1 patents
• H01L21/762 (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
• H01L23/49827 ({Via connections through the substrates, e.g. pins going through the substrate, coaxial cables (): 1 patents
• H01L23/522 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H10D86/215 (No explanation available): 1 patents
• H01L23/5226 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L23/528 ({Geometry or} layout of the interconnection structure {(): 1 patents
• H10D86/011 (No explanation available): 1 patents
• H10D89/10 (No explanation available): 1 patents
• H01L21/28525 ({the conductive layers comprising semiconducting material (): 1 patents
• H01L21/28568 (from a gas or vapour, e.g. condensation): 1 patents
• H01L23/5221 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L23/5286 ({Geometry or} layout of the interconnection structure {(): 1 patents
• H01L23/53209 ({based on metals, e.g. alloys, metal silicides (): 1 patents
• H01L23/53271 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H10D30/024 (No explanation available): 1 patents
• H10D30/6215 (No explanation available): 1 patents
• H10D30/6217 (No explanation available): 1 patents
• H10D30/6219 (No explanation available): 1 patents
• H10D64/512 (No explanation available): 1 patents
• H10D64/517 (No explanation available): 1 patents
• H10D64/518 (No explanation available): 1 patents
• H10D64/519 (No explanation available): 1 patents
• H10D84/0186 (No explanation available): 1 patents
• H10D84/0193 (No explanation available): 1 patents
• H10D84/038 (No explanation available): 1 patents
• H10D84/853 (No explanation available): 1 patents
• H01L29/0653 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• H01L27/092 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents

Companies

List of Companies

• TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.: 4 patents

Collaborators

• CHIH-LIANG CHEN (2 collaborations)
• JUNG-CHAN YANG (2 collaborations)
• JOHNNY CHIAHAO LI (1 collaborations)
• SHIH-MING CHANG (1 collaborations)
• KEN-HSIEN HSIEH (1 collaborations)
• CHI-YU LU (1 collaborations)
• YUNG-CHEN CHIEN (1 collaborations)
• JERRY CHANG JUI KAO (1 collaborations)
• XIANGDONG CHEN of SAN DIEGO CA (US) (1 collaborations)
• POCHUN WANG (1 collaborations)
• GUO-HUEI WU (1 collaborations)
• LI-CHUN TIEN (1 collaborations)
• SHUN-LI CHEN (1 collaborations)
• CHUNG-TE LIN (1 collaborations)
• PIN-DAI SUE (1 collaborations)
• TING-WEI CHIANG (1 collaborations)
• CHENG-I HUANG (1 collaborations)
• KUO-NAN YANG (1 collaborations)