Category:Ching-Yu Chang of Hsinchu (TW)
Ching-Yu Chang
Ching-Yu Chang from Hsinchu (TW) has applied for patents in technology areas such as G03F7/09, G03F7/004, G03F7/105 with taiwan semiconductor manufacturing company, ltd..
Patents
Pages in category "Ching-Yu Chang of Hsinchu (TW)"
The following 16 pages are in this category, out of 16 total.
1
- 17737810. PHOTORESIST COMPOSITION AND METHODS OF USE simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18167741. SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18335852. PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18447673. PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18639575. METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18941798. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, LTD.)
T
- Taiwan semiconductor manufacturing co., ltd. (20240192601). PHOTORESIST TOP COATING MATERIAL FOR ETCHING RATE CONTROL simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240329535). DOSE REDUCTION BOTTOM ANTI-REFLECTIVE COATING FOR METALLIC PHOTORESIST simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240419069). PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Taiwan semiconductor manufacturing company, ltd. (20240210822). SWITCHABLE SUBSTRATE FOR EXTREME ULTRAVIOLET OR E-BEAM METALLIC RESIST simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240282571). METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250068075). METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
U
- US Patent Application 17734975. POLYMER CROSSLINK DE-CROSSLINK PROCESSES FOR RESIST PATTERNING simplified abstract
- US Patent Application 17734981. CROSSLINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY simplified abstract
- US Patent Application 17750148. SYSTEM AND METHOD FOR DIRECTED SELF-ASSEMBLY WITH HIGH BOILING POINT SOLVENT simplified abstract
- US Patent Application 18227231. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract