Applied materials, inc. (20250132165). CHLORINE-FREE REMOVAL OF MOLYBDENUM OXIDES FROM SUBSTRATES
CHLORINE-FREE REMOVAL OF MOLYBDENUM OXIDES FROM SUBSTRATES
Organization Name
Inventor(s)
Kevin Kashefi of San Ramon CA US
Mark Saly of Santa Clara CA US
Xianmin Tang of San Jose CA US
CHLORINE-FREE REMOVAL OF MOLYBDENUM OXIDES FROM SUBSTRATES
This abstract first appeared for US patent application 20250132165 titled 'CHLORINE-FREE REMOVAL OF MOLYBDENUM OXIDES FROM SUBSTRATES
Original Abstract Submitted
methods of removing molybdenum oxide from a surface of a substrate comprise exposing the substrate having a molybdenum oxide layer on the substrate to a halide etchant having the formula rsix, wherein m is an integer from 1 to 3, x is selected from iodine (i) and bromine (br) and r is selected from the group consisting of a methyl group, ethyl group, propyl group, butyl group, cyclohexyl group and cyclopentyl group. the methods may be performed in a back-end-of-the line (beol) process, and the substrate contains a low-k dielectric material.