Applied materials, inc. (20250117754). EPITAXIAL FILM DEFECT DETERMINATION
EPITAXIAL FILM DEFECT DETERMINATION
Organization Name
Inventor(s)
Winston Chen of Los Altos CA US
Jenn-Yue Wang of Santa Clara CA US
Cathy Cai of Santa Clara CA US
Weizong Xu of Santa Clara CA US
Balasubramanian Pranatharthiharan of San Jose CA US
EPITAXIAL FILM DEFECT DETERMINATION
This abstract first appeared for US patent application 20250117754 titled 'EPITAXIAL FILM DEFECT DETERMINATION
Original Abstract Submitted
a method includes obtaining, by a processing device, first image data of a substrate including an epitaxial film. the method further includes applying a frequency domain filter to the first image data to obtain filtered image data. the method further includes determining a number of epitaxial defects represented in the first image data by performing feature detection on the filtered image data. the method further includes performing a corrective action in view of the number of epitaxial defects.
- Applied materials, inc.
- Ruiying Hao of San Jose CA US
- Winston Chen of Los Altos CA US
- Jenn-Yue Wang of Santa Clara CA US
- Cathy Cai of Santa Clara CA US
- Weizong Xu of Santa Clara CA US
- Lifan Chen of Fremont CA US
- Balasubramanian Pranatharthiharan of San Jose CA US
- G06Q10/20
- G06T7/00
- G06V10/48
- G06V10/88
- CPC G06Q10/20