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Applied materials, inc. (20250108479). POLISHING HEAD WITH FLEXURE EXTENDING THROUGH PRESSURE CHAMBER

From WikiPatents

POLISHING HEAD WITH FLEXURE EXTENDING THROUGH PRESSURE CHAMBER

Organization Name

applied materials, inc.

Inventor(s)

Andrew J. Nagengast of Sunnyvale CA US

Jeonghoon Oh of Saratoga CA US

Kuen-Hsiang Chen of Sunnyvale CA US

Steven M. Zuniga of Soquel CA US

Takashi Fujikawa of San Jose CA US

Jay Gurusamy of Santa Clara CA US

Ekaterina A. Mikhaylichenko of San Jose CA US

Eric L. Lau of Santa Clara CA US

Huanbo Zhang of San Jose CA US

Welarumage Ravin Fernando of Santa Clara CA US

POLISHING HEAD WITH FLEXURE EXTENDING THROUGH PRESSURE CHAMBER

This abstract first appeared for US patent application 20250108479 titled 'POLISHING HEAD WITH FLEXURE EXTENDING THROUGH PRESSURE CHAMBER

Original Abstract Submitted

a carrier head for chemical mechanical polishing includes a housing for attachment to a drive shaft, a membrane assembly arranged beneath the lower carrier body, and a flexure. the membrane assembly includes a membrane support and a flexible membrane secured to the membrane support to defining a plurality of pressurizable lower chambers, with the flexible membrane having a lower surface that provides a substrate mounting surface. a flexible seal forms a pressurizable upper chamber between the housing and the membrane support. the flexure connects the membrane support to the housing, and the flexure extends through the pressurizable upper chamber.

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