Applied materials, inc. (20250108473). POLISHING HEAD WITH DECOUPLED MEMBRANE POSITION CONTROL
POLISHING HEAD WITH DECOUPLED MEMBRANE POSITION CONTROL
Organization Name
Inventor(s)
Andrew J. Nagengast of Sunnyvale CA US
Jeonghoon Oh of Saratoga CA US
Kuen-Hsiang Chen of Sunnyvale CA US
Steven M. Zuniga of Soquel CA US
Takashi Fujikawa of San Jose CA US
Jay Gurusamy of Santa Clara CA US
Ekaterina A. Mikhaylichenko of San Jose CA US
Huanbo Zhang of San Jose CA US
Welarumage Ravin Fernando of Santa Clara CA US
POLISHING HEAD WITH DECOUPLED MEMBRANE POSITION CONTROL
This abstract first appeared for US patent application 20250108473 titled 'POLISHING HEAD WITH DECOUPLED MEMBRANE POSITION CONTROL
Original Abstract Submitted
chemical mechanical polishing system and method include a substrate is loaded into a carrier head having a housing having an upper carrier body and a lower carrier body, and a membrane assembly beneath the lower carrier body. a space between the lower carrier body and the membrane assembly defines a pressurizable chamber, a distance from a sensor in the lower carrier body to the membrane assembly is measured, and pressure in the pressurizable chamber is controlled based on the measured distances to maintain a consistent total downforce on the membrane assembly as the distance between the sensor and the membrane assembly changes.
- Applied materials, inc.
- Andrew J. Nagengast of Sunnyvale CA US
- Jeonghoon Oh of Saratoga CA US
- Kuen-Hsiang Chen of Sunnyvale CA US
- Steven M. Zuniga of Soquel CA US
- Takashi Fujikawa of San Jose CA US
- Jay Gurusamy of Santa Clara CA US
- Ekaterina A. Mikhaylichenko of San Jose CA US
- Eric Lau of Santa Clara CA US
- Huanbo Zhang of San Jose CA US
- Welarumage Ravin Fernando of Santa Clara CA US
- B24B37/005
- B24B37/04
- B24B37/24
- B24B49/16
- CPC B24B37/005