Applied materials, inc. (20250095967). PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
Organization Name
Inventor(s)
Morgan D. Evans of Manchester MA US
Peter F. Kurunczi of Cambridge MA US
PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
This abstract first appeared for US patent application 20250095967 titled 'PLASMA SOURCE WITH MULTIPLE EXTRACTION APERTURES
Original Abstract Submitted
a plasma source having two extraction apertures is disclosed. the extraction apertures are not co-planar, allowing a scanned workpiece to be impacted by particles or ions from two different directions during a single scan pass. the chamber housing of the plasma source may be cylindrical or may have a polygonal cross-section. in some embodiments, external plates are mounted to the chamber housing to provide defining apertures which serve to further collimate the particles or ions that exit each extraction aperture. various different plasma generators may be utilized with this plasma source, including internal antenna elements, external coils, cathodes, filaments and other mechanisms.