Applied materials, inc. (20250006487). DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
Organization Name
Inventor(s)
Daemian Raj Benjamin Raj of Fremont CA US
Gregory Eugene Chichkanoff of Mountain View CA US
Shailendra Srivastava of Fremont CA US
Sai Susmita Addepalli of San Jose CA US
Nikhil Sudhindrarao Jorapur of Sunnyvale CA US
Abhigyan Keshri of Sunnyvale CA US
Allison Yau of Cupertino CA US
DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
This abstract first appeared for US patent application 20250006487 titled 'DYNAMIC MULTI ZONE FLOW CONTROL FOR A PROCESSING SYSTEM
Original Abstract Submitted
in one example, a process chamber comprises a lid assembly, a first gas supply, second gas supply, a chamber body, and a substrate support. the lid assembly comprises a gas box, a gas conduit passing through the gas box, a blocker plate, and a showerhead. the gas box comprises a gas distribution plenum, and a distribution plate comprising a plurality of holes aligned with the gas distribution plenum. the blocker plate is coupled to the gas box forming a first plenum. the showerhead is coupled to the blocker plate forming a second plenum. the first gas supply is coupled to the gas distribution plenum, and the second gas supply system is coupled to the gas conduit. the chamber body is coupled to the showerhead, and the substrate support assembly is disposed within an interior volume of the chamber body, and is configured to support a substrate during processing.
- Applied materials, inc.
- Daemian Raj Benjamin Raj of Fremont CA US
- Gregory Eugene Chichkanoff of Mountain View CA US
- Shailendra Srivastava of Fremont CA US
- Sai Susmita Addepalli of San Jose CA US
- Nikhil Sudhindrarao Jorapur of Sunnyvale CA US
- Abhigyan Keshri of Sunnyvale CA US
- Allison Yau of Cupertino CA US
- H01L21/02
- C23C16/455
- C23C16/458
- C23C16/50
- H01J37/32
- H10B41/20
- H10B43/20
- CPC H01L21/022