Applied materials, inc. (20250004457). RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING
Appearance
RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING
Organization Name
Inventor(s)
Pratik Champalal Kotcher of Chantilly VA US
RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING
This abstract first appeared for US patent application 20250004457 titled 'RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING
Original Abstract Submitted
data associated with a first process performed for one or more substrates is identified. an amount of drift of a first set of metrology measurement values for the one or more substrates following completion of the first process and/or the second process from target values is determined. modifications to a recipe for the second process is determined in view of the determined amount of drift. the second process is updated based on the determined one or more modifications.