Jump to content

Applied materials, inc. (20250004457). RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING

From WikiPatents

RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING

Organization Name

applied materials, inc.

Inventor(s)

Pratik Champalal Kotcher of Chantilly VA US

RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING

This abstract first appeared for US patent application 20250004457 titled 'RUN-TO-RUN CONTROL AT A MANUFACTURING SYSTEM USING MACHINE LEARNING

Original Abstract Submitted

data associated with a first process performed for one or more substrates is identified. an amount of drift of a first set of metrology measurement values for the one or more substrates following completion of the first process and/or the second process from target values is determined. modifications to a recipe for the second process is determined in view of the determined amount of drift. the second process is updated based on the determined one or more modifications.

Cookies help us deliver our services. By using our services, you agree to our use of cookies.