DEDICATED SULFURIC-PEROXIDE PROCESS MODULE FOR POST-CMP CLEANING PLATFORMS

Organization Name

applied materials, inc.

Inventor(s)

Clinton Sakata of San Jose CA (US)

Ricardo Martinez of Manteca CA (US)

Robert Dues of Austin TX (US)

Shih-Yu Liu of Santa Clara CA (US)

Tarun Kumar Abichandani of Sunnyvale CA (US)

Brian K. Kirkpatrick of Sunnyvale CA (US)

Jagan Rangarajan of San Jose CA (US)

Adrian S. Blank of Gilroy CA (US)

Edward Golubovsky of San Jose CA (US)

Justin H. Wong of Pleasanton CA (US)

DEDICATED SULFURIC-PEROXIDE PROCESS MODULE FOR POST-CMP CLEANING PLATFORMS

This abstract first appeared for US patent application 20240412985 titled 'DEDICATED SULFURIC-PEROXIDE PROCESS MODULE FOR POST-CMP CLEANING PLATFORMS

Original Abstract Submitted

a substrate cleaning system to remove particulates from multiple substrates includes a cleaning tank for applying a cleaning liquid to substrates, a rinse tank for applying a rinsing liquid to substrates, and a robot system. the cleaning tank includes a stationary lid, an input lid, and an output lid. the input and output lids allow a substrate carrier designed to carry an individual substrate to access an inner volume of the cleaning tank for processing. a transport system moves the substrate in the substrate carrier through the inner volume of the cleaning tank by creating a series of gaps between substrates to allow proper processing. the robot system transports substrates through the input and output lids of the cleaning tank, and transports substrates into the rinse tank.