Applied materials, inc. (20240282558). PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY simplified abstract
PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY
Organization Name
Inventor(s)
Sathiyamurthi Govindasamy of Coimbatore (IN)
Harish V. Penmethsa of Dublin CA (US)
Suresh Palanisamy of Coimbatore (IN)
Naresh Kumar Asokan of Coimbatore (IN)
Karunakaran Nataraj of Coimbatore (IN)
PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240282558 titled 'PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY
Simplified Explanation: This patent application discusses methods and apparatus for enhancing film uniformity in a physical vapor deposition process. It introduces a magnetron translation assembly that includes linear actuator assemblies, rails, actuators, magnets, and mounting surfaces to improve the deposition process.
- The magnetron translation assembly includes a first linear actuator assembly with a first rail aligned in a first direction, a first actuator for positioning a first mount along the first rail, a magnet assembly mounted on the first mount for rotation, and a second linear actuator assembly with a second rail aligned in a second direction.
- The magnet assembly is designed to rotate about an axis perpendicular to the first rail, allowing for better control and distribution of the deposition material.
- The second linear actuator assembly is coupled to a mounting surface of the second mount, enabling precise movement and positioning of the magnetron translation assembly during the deposition process.
- This innovation aims to enhance film uniformity in physical vapor deposition processes, leading to improved product quality and performance.
- By incorporating these components into the deposition process, the patent application seeks to address challenges related to film thickness variation and non-uniformity in PVD processes.
Potential Applications: This technology can be applied in industries such as semiconductor manufacturing, optical coatings, and thin film deposition for various electronic devices.
Problems Solved: This technology addresses issues related to film uniformity, thickness variation, and overall quality control in physical vapor deposition processes.
Benefits: The benefits of this technology include improved product quality, enhanced performance of electronic devices, and increased efficiency in the deposition process.
Commercial Applications: Title: Enhanced Film Uniformity Technology for Physical Vapor Deposition Processes This technology can be utilized in semiconductor manufacturing, optical coatings for lenses, and thin film deposition for electronic devices, leading to improved product quality and performance in various industries.
Prior Art: Readers can explore prior art related to physical vapor deposition processes, magnetron translation assemblies, and film uniformity enhancement techniques in the field of thin film deposition technologies.
Frequently Updated Research: Researchers may find updated studies on film uniformity improvement techniques, advancements in physical vapor deposition processes, and innovations in magnetron translation assemblies relevant to this technology.
Questions about Enhanced Film Uniformity Technology for Physical Vapor Deposition Processes: 1. How does the magnetron translation assembly improve film uniformity in physical vapor deposition processes? 2. What are the potential applications of this technology in different industries?
Original Abstract Submitted
apparatus and methods for improving film uniformity in a physical vapor deposition (pvd) process are provided herein. in some embodiments, a magnetron translation assembly comprises a first linear actuator assembly with a first rail which is aligned in a first direction and a first actuator that is configured to position a first mount along the first rail; a magnet assembly is mounted on the first mount, the magnet assembly constructed and arranged to be rotated about an axis perpendicular to the first rail; and a second linear actuator assembly comprising a second mount that is configured to be positioned along a second rail, which is aligned in a second direction and the first linear actuator assembly is coupled to a mounting surface of the second mount.
