MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS

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MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS - A simplified explanation of the abstract

This abstract first appeared for US patent application 20240279804 titled 'MOLYBDENUM(0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS

Simplified Explanation: This patent application describes molybdenum precursors and methods for forming molybdenum-containing films on a substrate surface. The precursors have high purity levels of molybdenum and are used to create films with high molybdenum content.

Molybdenum precursors with over 90% molybdenum purity are used.
Films with over 80% molybdenum content are formed on the substrate surface.
The exposure to precursors and reactants can be sequential or simultaneous.

Key Features and Innovation:

High-purity molybdenum precursors for film formation.
Films with high molybdenum content on the substrate surface.
Flexibility in exposure methods for precursor and reactant.

Potential Applications:

Semiconductor industry for thin film deposition.
Solar panel manufacturing for efficient energy conversion.
Aerospace industry for corrosion-resistant coatings.

Problems Solved:

Ensures high molybdenum content in films.
Provides a reliable method for forming molybdenum-containing films.

Benefits:

Improved film quality with high molybdenum purity.
Enhanced performance in various industrial applications.

Commercial Applications: Molybdenum-containing films can be used in semiconductor manufacturing, solar panel production, and aerospace applications, providing high-performance coatings for various industries.

Questions about Molybdenum Precursors: 1. How do high-purity molybdenum precursors improve film quality? 2. What are the potential applications of molybdenum-containing films in the aerospace industry?

Frequently Updated Research: Ongoing research may focus on optimizing the deposition process for molybdenum-containing films to enhance their properties and applications.

Original Abstract Submitted

molybdenum(0) precursors and methods of forming molybdenum-containing films on a substrate surface are described. the molybdenum(0) precursors have a purity of greater than or equal to 90% molybdenum (mo) on a molar basis. the substrate is exposed to a molybdenum(0) precursor and a reactant to form a molybdenum-containing film having greater than or equal to 80% molybdenum (mo) on an atomic basis. in some embodiments, the molybdenum-containing film has greater than or equal to 80% molybdenum (mo) on a molar basis. the exposures can be sequential or simultaneous.