ASML NETHERLANDS B.V. Patent Application Trends in 2024
ASML NETHERLANDS B.V. Patent Filing Activity
ASML NETHERLANDS B.V. patent applications in 2024
Top 10 Technology Areas
- G03F7/70633 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 26 patents
- Example: 20240231065. DARK FIELD MICROSCOPE simplified abstract (ASML NETHERLANDS B.V.)
- G03F7/70625 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 20 patents
- Example: 20240231065. DARK FIELD MICROSCOPE simplified abstract (ASML NETHERLANDS B.V.)
- H01J37/28 (with scanning beams {()
- H01J37/244 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps)
- G03F7/705 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 13 patents
- Example: 20240126181. PROCESS WINDOW BASED ON DEFECT PROBABILITY simplified abstract (ASML NETHERLANDS B.V.)
- G06T2207/30148 (Subject of image; Context of image processing)
- G06T2207/10061 (Image acquisition modality)
- G03F7/706839 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- G03F9/7088 ({for microlithography (measuring printed patterns for monitoring overlay)
- Count: 8 patents
- Example: 20240231247. METROLOGY METHOD AND APPARATUS simplified abstract (ASML Netherlands B.V.)
- G03F7/7065 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
Emerging Technology Areas
- G06V10/776 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING)
- G06F18/214 (Generating training patterns; Bootstrap methods, e.g. bagging or boosting)
- G06T7/0006 ({using a design-rule based approach})
- G06V10/774 (IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING)
- G06F2111/06 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- G03F7/2004 (Exposure; Apparatus therefor (photographic printing apparatus for making copies)
- G03F7/70583 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- G01N2223/3307 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms)
- G01N23/2206 (INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES (measuring or testing processes other than immunoassay, involving enzymes or microorganisms)
- G01B11/24 (MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS)
Top Inventors
- Patrick Sebastian UEBEL (9 patents)
- Sebastianus Adrianus GOORDEN (8 patents)
- Weiming REN of San Jose CA (US) (6 patents)
- Xuedong LIU of San Jose CA (US) (6 patents)
- Marco Jan-Jaco WIELAND (6 patents)
- Simon Gijsbert Josephus MATHIJSSEN (6 patents)
- Arie Jeffrey DEN BOEF (6 patents)
- Maxim PISARENCO (5 patents)
- Wim Tjibbo TEL (5 patents)
- Xuerang HU of San Jose CA (US) (5 patents)
Patent Categories
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Geographical Distribution of Inventors
Geographical Distribution of US Inventors
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- ASML NETHERLANDS B.V.
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- Patent Trends by Company in 2024
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