SUBSTRATE PROCESSING APPARATUS

Abstract: a substrate processing apparatus includes a chamber, a chamber door, an outer chamber, and a locking mechanism, in which the chamber door includes a first flange on which a substrate loader or a lower heater accommodating the substrate is placed, a rotating flange rotatably connected to the first flange, and a second flange disposed below the first flange and rotatably connected to the rotating flange.

Inventor(s): Young Joon Ham, Jeong Eui Kim, Yong Hwan Kwon, Jin Seok Lee, Jong Hwan Baek, Byung Wook Hwang, Yeon Min Mo

CPC Classification: H05B3/02 (ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL)

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