METHOD OF FILLING A GAP

Abstract: a method of filling a gap provided to a substrate, comprises: providing the substrate in a reactor, and performing a flowable gap-fill cycle repeatedly, the flowable gap-fill cycle includes forming a first solid layer on the surface of the gap, turning the first solid layer into a flowable layer by supplying a fluorine flow amount of a fluorine source activated by a power, and converting the flowable layer into a second solid layer. the method of filling a gap comprises calculating a ratio of fluorine flow amount to thickness of the first solid layer and controlling the fluorine flow amount based on the calculated ratio.

Inventor(s): Sungdae Woo, René Henricus Jozef Vervuurt

CPC Classification: H01L21/0228 ({deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD})

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