PROCESSING SYSTEM AND PROCESSING METHOD

Abstract: there is provided a system for processing a substrate under a depressurized environment. the system comprises: a processing chamber configured to perform desired processing on a substrate; a transfer chamber having a transfer mechanism configured to import or export the substrate into or from the processing chamber; and a controller configured to control a processing process in the processing chamber. the transfer mechanism comprises: a fork configured to hold the substrate on an upper surface; and a sensor provided in the fork and configured to measure an internal state of the processing chamber. the controller is configured to control the processing process in the processing chamber on the basis of the internal state of the processing chamber measured by the sensor.

Inventor(s): Norihiko AMIKURA, Makoto SAEGUSA, Jun HIROSE

CPC Classification: H01J37/32935 (Gas-filled discharge tubes (heating by discharge ))

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