VERTICALLY ADJUSTABLE PLASMA SOURCE

Abstract: the disclosure describes a plasma source assemblies comprising a differential screw assembly, an rf hot electrode, a top cover, an upper housing and a lower housing. the differential screw assembly is configured to provide force to align the plasma source assembly vertically matching planarity of a susceptor. more particularly, the differential screw assembly increases a distance between the top cover and the upper housing to align the gap with the susceptor. the disclosure also provides a better thermal management by cooling fins. a temperature capacity of the plasma source assemblies is extended by using titanium electrode. the disclosure provides a cladding material covering a portion of a first surface of rf hot electrode, a second surface of rf hot electrode, a bottom surface of rf hot electrode, a portion of a surface of the showerhead and a portion of lower housing surface.

Inventor(s): Tsutomu Tanaka, Jared Ahmad Lee, Rakesh Ramadas, Dmitry A. Dzilno, Gregory J. Wilson, Sriharish Srinivasan

CPC Classification: H01J37/32733 (Gas-filled discharge tubes (heating by discharge ))

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