Charged Particle Beam System

Abstract: the present disclosure provides a charged particle beam system capable of appropriately setting an image generation condition for evaluating an adjustment condition for a beam. the charged particle beam system includes a scanning deflector and an adjustment deflector configured to adjust a trajectory of a beam to be incident on an optical element. in the system, a user interface configured to display an image and a partial region of the image selected by a user is provided, and an input portion () for allowing the user to set at least one of the image (initial screen ), the partial region (), a first parameter relating to a scanning speed of the scanning deflector, and a second parameter relating to a change speed of the optical element is displayed on the user interface (see fig. ).

Inventor(s): Naoto ITO, Yu YAMAZAWA, Tsunenori NOMAGUCHI

CPC Classification: H01J37/265 (Electron or ion microscopes; Electron or ion diffraction tubes)

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