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20250232916. Capacitor Method Manufacturing Ca (Panasonic Intellectual Property Management ., .)

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CAPACITOR AND METHOD FOR MANUFACTURING CAPACITOR

Abstract: a capacitor includes a silicon substrate, a conductive layer, a dielectric layer, and an electrode layer. the silicon substrate has a first principal surface and a second principal surface opposite the first principal surface. the silicon substrate has a porous silicon region including a plurality of pores formed in the first principal surface. the conductive layer is disposed along a surface of the porous silicon region. the dielectric layer has a shape along the surface of the porous silicon region and is disposed on the conductive layer. the electrode layer is disposed on the dielectric layer.

Inventor(s): Tomohiro FUJITA, Yosuke HAGIHARA, Kazushi YOSHIDA

CPC Classification: H01G4/012 (CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE (selection of specified materials as dielectric ; capacitors having potential barriers ))

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