METHOD OF CONTROLLING ATMOSPHERE, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

Abstract: it is possible to reduce a consumption amount of an inert gas. there is provided a technique that includes: (a) moving a substrate between a first vessel and a second vessel wherein a substrate is processed in the second vessel and the first vessel is capable of communicating with the second vessel; (b) processing the substrate in the second vessel; and (c) waiting without processing the substrate in the second vessel, wherein an amount of an inert gas supplied into the first vessel in a state where an inner pressure of the first vessel is higher than that of the second vessel is adjusted such that the amount in (a) is greater than one or both of the amount in (b) and the amount in (c).

Inventor(s): Kaoru YAMAMOTO, Naofumi OHASHI

CPC Classification: C23C16/52 (Controlling or regulating the coating process {(, take precedence)})

Search for rejections for patent application number 20250230548