CONTROL SYSTEM, PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Abstract: there is provided a technique that includes a flow-rate controller including a regulator configured to be capable of regulating a flow rate of a gas; and a controller configured to be capable of switching between a first mode of the flow-rate controller in which the flow rate of the gas is regulated to a predetermined flow rate through operation of the regulator, and a second mode of the flow-rate controller in which the regulator is set to be in a full open state.

Inventor(s): Shunsuke NAKATANI

CPC Classification: C23C16/52 (Controlling or regulating the coating process {(, take precedence)})

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