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20250230546. Selective Control (Lam Research)

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SELECTIVE CONTROL OF MULTI-STATION PROCESSING CHAMBER COMPONENTS

Abstract: various embodiments herein relate to apparatuses, systems, and methods for selective control of multi-station processing chamber components. in some embodiments, a method comprises: determining for a station of a plurality of stations, a number of deposition cycles to be performed; causing a first number of deposition cycles to be performed for each of the plurality of stations by causing a first plurality of control components associated with a first station and a second plurality of control components associated with a second station to be set to a first position; and responsive to determining that the first number of deposition cycles has been completed: causing at least one component of the first plurality of control components to be changed to a second position; and causing additional deposition cycles to be performed for the second station by causing the second plurality of control components to remain in the first position.

Inventor(s): Douglas Walter Agnew, Eli Jeon, Daniel Boatright, Trung T. Le, Tuan Anh Nguyen, Cody Barnett, Joseph R. Abel, Siddappa Attur, Mani Sankaran Kartha

CPC Classification: C23C16/52 (Controlling or regulating the coating process {(, take precedence)})

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